Abstarct: In this study, the effect of various RF power, substrate bias voltage and working pressure on the generated phases, surface morphology, mechanical and chemical properties, titanium-copper diboride composite coating produced by magnetic sputtering in argon neutral gas, on stainless steel substrate Austenite is treated. X-ray diffraction analyzes and tests, scanning electron microscopy, elemental analysis, nanoindentation test, impedance test and electrochemical polarization were used to study the material structure, chemical composition and mechanical and chemical properties of the film. According to the studies, it was observed that with increasing the RF power applied to the copper target material, the sputtering rate of this target material increased and naturally the amount of copper in the chemical composition of the film increased. The corrosion resistance of the coating also decreased. To study the effect of the bias voltage applied to the substrate, in three different values 0 V, -50 V, -100 V the effect of this parameters was investigated. Finally, the effect of working pressure variable on the film was investigated. It was observed that with decreasing the amount of working pressure, sputtering rate and corrosion resistance of the coating increases, Also, by reducing the amount of this parameter, the amount of copper in the grain boundaries increases, which reduces the hardness of the film from 3.85 GPa to 1.76 GPa.